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Controlled Texture of Magnetron Sputtered Transparent Conducting ZnO: Al Films for Solar Cell ApplicationsBy Himadri Sekhar Samanta, Rajesh Das
Abstract: Textured transparent and conducting ZnO:Al films were prepared by rf-magnetron sputtering on glass substrate at a temperature 3500C under Ar and Ar+O2 gas ambient. ZnO:Al thin films shows a minimum electrical resistivity of (~8.210-4 Ω-cm), and high optical transmittance (T~86–90% average) in visible region. With increasing of oxygen concentration ZnO:Al films become more compact, stoichiometric and becomes more electrically resistive. ZnO:Al shows hexagonal wurtzite polycrystalline structure with strong (002) orientations. …
Published in International Journal of Nanomaterials and Nanostructures · Vol. 1, Issue 2, 2015 · pp. 12–19 Read article →