International Journal of Applied Nanotechnology
Porous Silicon and its Nanoparticles: A Theoretical Study
Abstract
It is very simple and cost consuming technique of fabrication of porous silicon film over silicon substrate and synthesizing the porous silicon and silicon nanoparticles. The etch reactions in RIVPSE process forms the porous structures without need of complex and expensive equipments. The luminescent porous film can be fabricated using this sample technique with any cost effecting methods such as extra energy excitation like plasma or ultraviolet photon and additional surfactants. Porous silicon retains the key semiconductor properties of silicon and is a machinable at a micro level. Porous silicon also demonstrates optical properties that provide the basis for a variety of potential devices for bio-degradable and bio-compatible diagnostics products. During such study’s thin layers of highly porous silicon or poly crystalline silicon nano meter size grain could dissolve completely away in simulated human plasma. Drug release kinetics can be controlled by altering the pore size and particle sizeKeywords
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